| Issue Date | Title | Author(s) | Relation | scopus | WOS | Fulltext/Archive link |
|---|---|---|---|---|---|---|
| 2005 | MBE-grown high gate dielectrics of HfO2 and (Hf–Al)O2 for Si and III–V semiconductors nano-electronics | Lee, W. C.; Lee, Y. J.; Wu, Y. D.; Chang, P.; Huang, Y. L.; Hsu, Y. L.; Mannaerts, J. P.; Lo, R. L.; Chen, F. R.; Maikap, S.; Lee, L. S.; Hsieh, W. Y.; Tsai, M. J.; Lin, S. Y.; Gustffson, T.; Hong, M.; Kwo, J. | Journal of crystal growth vol. 278, pp. 619-623 |
