| Issue Date | Title | Author(s) | Relation | scopus | WOS | Fulltext/Archive link |
|---|---|---|---|---|---|---|
| 2012 | Effect of substrate bias on the promotion of nanocrystalline silicon growth from He-diluted SiH4 plasma at low temperature | D. Das; D. Raha; W. C. Chen; K. H. Chen; C. T. Wu; L. C. Chen | JOURNAL OF MATERIALS RESEARCH 27, 1303 |
