Hybrid Si/TMD 2D Electronic Double Channels Fabricated Using Solid CVD Few-Layer-MoS2 Stacking for Vth Matching and CMOS-Compatible 3DFETs

Please use this identifier to cite or link to this item: http://ir.sinica.edu.tw/handle/201000000A/34708

Title:	Hybrid Si/TMD 2D Electronic Double Channels Fabricated Using Solid CVD Few-Layer-MoS2 Stacking for Vth Matching and CMOS-Compatible 3DFETs
Authors:	Min-Cheng Chen Chia-Yi Lin Kai-Hsin Li Lain-Jong Li Chang-Hsiao Chen Cheng-Hao Chuang Ming-Dao Lee Yi-Ju Chen Yun-Fang Hou Chang-Hsien Lin Chun-Chi Chen Bo-Wei Wu Cheng-San Wu Ivy Yang Yao-Jen Lee Wen-Kuan Yeh Tahui Wang Fu-Liang Yang Chenming Hu
Issue Date:	2014-12-15
Conference:	International Electron Devices Meeting (IEDM) (San Francisco, CA USA : IEEE)
URI:	http://ir.sinica.edu.tw/handle/201000000A/34708
Appears in Collections:	應用科學研究中心

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