Ellipsometric study of carbon nitride thin films with and without silicon addition

Please use this identifier to cite or link to this item: http://ir.sinica.edu.tw/handle/201000000A/44056

Title:	Ellipsometric study of carbon nitride thin films with and without silicon addition
Authors:	Chen, L. C. Lin, H. Y. Wong, C. S. Chen, K. H. Lin, S. T. Yu, Y. C. Wang, C. W. Lin, E. K. Lin, K. C.
Issue Date:	1999
Relation:	DIAMOND AND RELATED MATERIALS 8, 618-622
URI:	http://ir.sinica.edu.tw/handle/201000000A/44056
ISSN:	http://gateway.isiknowledge.com/gateway/Gateway.cgi?GWVersion=2&SrcAuth=Drexel&SrcApp=hagerty_opac&KeyRecord=0925-9635&DestApp=JCR&RQ=IF_CAT_BOXPLOT
Appears in Collections:	原子與分子科學研究所

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