http://ir.sinica.edu.tw/handle/201000000A/47257| Title: | Annealing effects on forming nickel silicide film prepared by MEVVA ion implantation | Authors: | Hsu, J. Y. Liang, J. H. |
Issue Date: | 2005 | Relation: | Nuclear Instruments and Methods in Phys. Research B241, 543-547 | URI: | http://ir.sinica.edu.tw/handle/201000000A/47257 |
| Appears in Collections: | 物理研究所 |
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