http://ir.sinica.edu.tw/handle/201000000A/77666| Title: | The atomic layer etching of molybdenum disulfides using low-power oxygen plasma | Authors: | Kuan-Chao Chen Chia-Wei Liu Chi Chen Shih-Yen Lin |
Issue Date: | 2019-03 | Relation: | Semiconductor Science and Technology 34(4), 045007 | URI: | http://ir.sinica.edu.tw/handle/201000000A/77666 | ISSN: | http://gateway.isiknowledge.com/gateway/Gateway.cgi?GWVersion=2&SrcAuth=Drexel&SrcApp=hagerty_opac&KeyRecord=0268-1242&DestApp=JCR&RQ=IF_CAT_BOXPLOT |
| Appears in Collections: | 應用科學研究中心 |
Items in DSpace are protected by copyright, with all rights reserved, unless otherwise indicated.
