Wide Band Gap Silicon Carbon Nitride Films Deposited by Electron Cyclotron Resonance Plasma Chemical Vapor Deposition

請用此 Handle URI 來引用此文件： http://ir.sinica.edu.tw/handle/201000000A/44054

題名:	Wide Band Gap Silicon Carbon Nitride Films Deposited by Electron Cyclotron Resonance Plasma Chemical Vapor Deposition
作者:	Chen, K. H. Wu, J. J. Wen, C. Y. Chen, L. C. Fan, C. W. Kuo, P. F. Chen, Y. F. Huang, Y. S.
公開日期:	1999
關聯:	THIN SOLID FILMS 355-356, 205-209
URI:	http://ir.sinica.edu.tw/handle/201000000A/44054
ISSN:	http://gateway.isiknowledge.com/gateway/Gateway.cgi?GWVersion=2&SrcAuth=Drexel&SrcApp=hagerty_opac&KeyRecord=0040-6090&DestApp=JCR&RQ=IF_CAT_BOXPLOT
顯示於：	原子與分子科學研究所

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