Skip navigation
  • 中文
  • English

DSpace CRIS

  • DSpace logo
  • Home
  • Organizations
  • Researchers
  • Research Outputs
  • Projects
  • Explore by
    • Organizations
    • Researchers
    • Research Outputs
    • Projects
  • Academic & Publications
  • Sign in
  • 中文
  • English
  1. Scholars Hub of the Academia Sinica
  2. 數理科學組
  3. 原子與分子科學研究所
Please use this identifier to cite or link to this item: http://ir.sinica.edu.tw/handle/201000000A/81424
Title: Reaction-limited graphene CVD surpasses silicon production rate
Authors: Chin, Hao-Ting
Nguyen, Hai-Thai
Chen, Szu-Hua
Chen, Yi-Fang
Chen, Wei-Hung
Chou, Zhi-Yang
Chu, Yi-Hung
Yen, Zhi-Long
Ting, Chu-Chi
Hofmann, Mario
Hsieh, Ya-Ping 
Issue Date: 2021-07
Relation: 2D Materials 8(3):035016
URI: http://ir.sinica.edu.tw/handle/201000000A/81424
ISSN: http://gateway.isiknowledge.com/gateway/Gateway.cgi?GWVersion=2&SrcAuth=Drexel&SrcApp=hagerty_opac&KeyRecord=2053-1583&DestApp=JCR&RQ=IF_CAT_BOXPLOT
URL: http://dx.doi.org/10.1088/2053-1583/abf235
Appears in Collections:原子與分子科學研究所

Show full item record

Page view(s)

66
Last Week
0
Last month
0
checked on Jun 9, 2025

Google ScholarTM

Check


Items in DSpace are protected by copyright, with all rights reserved, unless otherwise indicated.

Explore by
  • Academic & Publications
  • Organizations
  • Researchers
  • Research Outputs
  • Projects
Build with DSpace-CRIS - Extension maintained and optimized by Logo 4SCIENCE Feedback