http://ir.sinica.edu.tw/handle/201000000A/81424| Title: | Reaction-limited graphene CVD surpasses silicon production rate | Authors: | Chin, Hao-Ting Nguyen, Hai-Thai Chen, Szu-Hua Chen, Yi-Fang Chen, Wei-Hung Chou, Zhi-Yang Chu, Yi-Hung Yen, Zhi-Long Ting, Chu-Chi Hofmann, Mario Hsieh, Ya-Ping |
Issue Date: | 2021-07 | Relation: | 2D Materials 8(3):035016 | URI: | http://ir.sinica.edu.tw/handle/201000000A/81424 | ISSN: | http://gateway.isiknowledge.com/gateway/Gateway.cgi?GWVersion=2&SrcAuth=Drexel&SrcApp=hagerty_opac&KeyRecord=2053-1583&DestApp=JCR&RQ=IF_CAT_BOXPLOT | URL: | http://dx.doi.org/10.1088/2053-1583/abf235 |
| Appears in Collections: | 原子與分子科學研究所 |
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